Ultra-thin film deposition and characterisation of 10nm amorphous carbon layers for applications in magnetic storage devices

J. Mc Laughlin, P. Maguire, A. Ogwu, R. Lamberton, J. F. Zhao, P. Lemoine

Research output: Contribution to journalArticlepeer-review

8 Citations (Scopus)

Abstract

This paper will present an overview of our latest results using various ultra-thin film amorphous carbon deposition techniques, and focus on first to grow studies, nano-characterisation of the electrical, mechanical and barrier properties associated with fil grown on various substrate types applied to the magnetic recording industry. Although some of the characterisation is carried out on 10nm coatings, the nanomechanical measurements are performed on samples with thickness values between 30nm to 200nm. This overview of our work deals with PECVD deposition techniques and examines ultra-thin film growth on Si and Al2O3: TiC substrates. Some results are presented on the functional benefits of doping a-C:H films with Silicon and Nitrogen. All the work is related to the ability to produce effective 3nm to 10nm overcoat layers for new magnetic reciting applications.

Original languageEnglish
Pages (from-to)167-180
Number of pages14
JournalInternational Journal of Modern Physics B
Volume14
Issue number2-3
DOIs
Publication statusPublished - Jan 30 2000
Externally publishedYes

All Science Journal Classification (ASJC) codes

  • Statistical and Nonlinear Physics
  • Condensed Matter Physics

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