Time-modulated CVD process Optimised using the Tagychi method

W. Ahmed, E. Ahmsd, C. Maryan, M. J. Jackson, A. A. Ogwu, N. Ali, V. F. Neto, J. Gracio

Research output: Chapter in Book/Report/Conference proceedingConference contribution

Abstract

In this paper, we employ the Taguchi method to optimise our newly developed time-modulated chemical vapour deposition (TMCVD) process. TMCVD can be used to deposit smoother, nano-crystalline diamond (NCD) coatings onto a range of substrate materials. The implementation of the Taguchi method to optimise the TMCVD process can effectively save valuable time, considerable effort and money, this being the major advantage of the method. The Taguchi method significantly reduces the number of experiments required to optimise a fabrication process. In this study, we investigate the effect of five TMCVD process parameters on five key factors of the as-grown samples. Each parameter was varied at 4 different values (experimental levels). The 5 considered parameters, taking into consideration the experimental levels, were optimised after performing only 16 experiments. The as-grown films were characterised for hardness, quality, surface roughness and microstructure using SEM, Raman spectroscopy, surface profilometry and Vickers hardness testing.

Original languageEnglish
Title of host publicationSurface Engineering - Proceedings of the 4th International Surface Engineering Conference
Pages29-37
Number of pages9
Publication statusPublished - 2006
Externally publishedYes
Event4th International Surface engineering Conference - St. Paul, MN, United States
Duration: Aug 1 2005Aug 3 2005

Publication series

NameSurface Engineering - Proceedings of the 4th International Surface Engineering Conference
Volume2005

Conference

Conference4th International Surface engineering Conference
Country/TerritoryUnited States
CitySt. Paul, MN
Period8/1/058/3/05

All Science Journal Classification (ASJC) codes

  • Engineering(all)

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