Thin coating deposition by magnetron sputtering: Production, Properties, and Applications of High Temperature Coatings

P.I. Odetola, P. Popoola, P. Oladijo

Research output: Chapter in Book/Report/Conference proceedingChapter

2 Citations (Scopus)

Abstract

Advances in thin-film deposition expose new frontiers to structures and phases that are inaccessible by conventional chemical means and have led to innovative modification of existing materials' properties. Thin-film deposition by magnetron sputtering is highly dependent on ion bombardments; coupled with sublimation of solid target unto the substrate through momentum transfer. It is summarily base on phase change of target material under high-energy influence; corresponding controlled condensation of sputtered atoms on substrate material during which process parameters and growth conditions dictate the pace of the atomic scale processes for thin-film formation. Magnetron sputtering is a state-of-the-art thin film deposition technique versatile for several unique applications, especially in the semiconductor industry. Magnetron sputtering is very novel in its use to achieve low-pressure condition that maximizes and conserve stream of electrons for effective knocking of inert atoms into ions. This ensures the highenergy acquired is not dissipated in gas-phase collisions.
Original languageEnglish
Title of host publication Production, Properties, and Applications of High Temperature Coatings
PublisherIGI Global
Pages403-428
Number of pages26
ISBN (Electronic)9781522541950
DOIs
Publication statusPublished - 2018

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Odetola, P. I., Popoola, P., & Oladijo, P. (2018). Thin coating deposition by magnetron sputtering: Production, Properties, and Applications of High Temperature Coatings. In Production, Properties, and Applications of High Temperature Coatings (pp. 403-428). IGI Global. https://doi.org/10.4018/978-1-5225-4194-3.ch015