Thin coating deposition by magnetron sputtering: Production, Properties, and Applications of High Temperature Coatings

P.I. Odetola, P. Popoola, P. Oladijo

Research output: Chapter in Book/Report/Conference proceedingChapter

2 Citations (Scopus)

Abstract

Advances in thin-film deposition expose new frontiers to structures and phases that are inaccessible by conventional chemical means and have led to innovative modification of existing materials' properties. Thin-film deposition by magnetron sputtering is highly dependent on ion bombardments; coupled with sublimation of solid target unto the substrate through momentum transfer. It is summarily base on phase change of target material under high-energy influence; corresponding controlled condensation of sputtered atoms on substrate material during which process parameters and growth conditions dictate the pace of the atomic scale processes for thin-film formation. Magnetron sputtering is a state-of-the-art thin film deposition technique versatile for several unique applications, especially in the semiconductor industry. Magnetron sputtering is very novel in its use to achieve low-pressure condition that maximizes and conserve stream of electrons for effective knocking of inert atoms into ions. This ensures the highenergy acquired is not dissipated in gas-phase collisions.
Original languageEnglish
Title of host publication Production, Properties, and Applications of High Temperature Coatings
PublisherIGI Global
Pages403-428
Number of pages26
ISBN (Electronic)9781522541950
DOIs
Publication statusPublished - 2018

Fingerprint

magnetron sputtering
coatings
thin films
sublimation
momentum transfer
atoms
bombardment
ions
low pressure
condensation
industries
vapor phases
collisions
electrons
energy

Cite this

Odetola, P. I., Popoola, P., & Oladijo, P. (2018). Thin coating deposition by magnetron sputtering: Production, Properties, and Applications of High Temperature Coatings. In Production, Properties, and Applications of High Temperature Coatings (pp. 403-428). IGI Global. https://doi.org/10.4018/978-1-5225-4194-3.ch015
Odetola, P.I. ; Popoola, P. ; Oladijo, P. / Thin coating deposition by magnetron sputtering : Production, Properties, and Applications of High Temperature Coatings. Production, Properties, and Applications of High Temperature Coatings. IGI Global, 2018. pp. 403-428
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Odetola, PI, Popoola, P & Oladijo, P 2018, Thin coating deposition by magnetron sputtering: Production, Properties, and Applications of High Temperature Coatings. in Production, Properties, and Applications of High Temperature Coatings. IGI Global, pp. 403-428. https://doi.org/10.4018/978-1-5225-4194-3.ch015

Thin coating deposition by magnetron sputtering : Production, Properties, and Applications of High Temperature Coatings. / Odetola, P.I.; Popoola, P.; Oladijo, P.

Production, Properties, and Applications of High Temperature Coatings. IGI Global, 2018. p. 403-428.

Research output: Chapter in Book/Report/Conference proceedingChapter

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M3 - Chapter

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BT - Production, Properties, and Applications of High Temperature Coatings

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Odetola PI, Popoola P, Oladijo P. Thin coating deposition by magnetron sputtering: Production, Properties, and Applications of High Temperature Coatings. In Production, Properties, and Applications of High Temperature Coatings. IGI Global. 2018. p. 403-428 https://doi.org/10.4018/978-1-5225-4194-3.ch015