Taguchi analysis of surface roughness of tic thin films deposited by rf magnetron sputtering

Olayinka Oluwatosin Abegunde, Esther T. Akinlabi, O. P. Oladijo

Research output: Contribution to conferencePaper

Abstract

The surface roughness of materials can affect the performance of the surface properties of materials. For a material to perform and interact optimally on the interfacial level with the surrounding environment, it is crucial the surface roughness is also optimized. In this research study, RF magnetron sputtering was used to deposit TiC thin films. Taguchi analysis was used for optimizing the process parameters for optimal surface roughness. Three levels and three factors were developed for the experimental matrix with RF power, sputtering time and temperatures as the independent factors. Optical profilometer was used for the characterization of the surface roughness, and Raman analysis was performed to study the structural defect on the thin film surface. From the Taguchi analysis, the RF Power contributed the most to the surface roughness properties with contribution rate of 95.62% and error level of 3.63%. The result of the Raman analysis shows that the process parameters affect the structural orientation defect of the thin films with no active vibration for some thin films produced at RF power of 200 W.

Original languageEnglish
Pages77-85
Number of pages9
DOIs
Publication statusPublished - Sep 2020
Event5th International Conference on Mechanical, Manufacturing and Plant Engineering, ICMMPE 2019 - Kuala Lumpur, Malaysia
Duration: Nov 19 2019Nov 21 2019

Conference

Conference5th International Conference on Mechanical, Manufacturing and Plant Engineering, ICMMPE 2019
CountryMalaysia
CityKuala Lumpur
Period11/19/1911/21/19

All Science Journal Classification (ASJC) codes

  • Automotive Engineering
  • Aerospace Engineering
  • Mechanical Engineering
  • Fluid Flow and Transfer Processes

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  • Cite this

    Abegunde, O. O., Akinlabi, E. T., & Oladijo, O. P. (2020). Taguchi analysis of surface roughness of tic thin films deposited by rf magnetron sputtering. 77-85. Paper presented at 5th International Conference on Mechanical, Manufacturing and Plant Engineering, ICMMPE 2019, Kuala Lumpur, Malaysia. https://doi.org/10.1007/978-981-15-5753-8_8