Optimisation of the new time-modulated CVD process using the Taguchi method

N. Ali, V. F. Neto, Sen Mei, G. Cabral, Y. Kousar, E. Titus, A. A. Ogwu, D. S. Misra, J. Gracio

Research output: Contribution to journalArticlepeer-review

39 Citations (Scopus)

Abstract

In this paper, we employ the Taguchi method to optimise our newly developed time-modulated chemical vapour deposition (TMCVD) process. TMCVD can be used to deposit smoother, nanocrystalline diamond (NCD) coatings onto a range of substrate materials. The implementation of the Taguchi method to optimise the TMCVD process can effectively save valuable time, considerable effort and money, this being the major advantage of the method. The Taguchi method significantly reduces the number of experiments required to optimise a fabrication process. In this study, we investigate the effect of five TMCVD process parameters on five key factors of the as-grown samples. Each parameter was varied at four different values (experimental levels). The 5 considered parameters, taking into consideration the experimental levels, were optimised after performing only 16 experiments. The as-grown films were characterised for hardness, quality, surface roughness and microstructure using SEM, Roman spectroscopy, surface profilometry and Vickers hardness testing.

Original languageEnglish
Pages (from-to)154-160
Number of pages7
JournalThin Solid Films
Volume469-470
Issue numberSPEC. ISS.
DOIs
Publication statusPublished - Dec 22 2004
Externally publishedYes

All Science Journal Classification (ASJC) codes

  • Electronic, Optical and Magnetic Materials
  • Surfaces and Interfaces
  • Surfaces, Coatings and Films
  • Metals and Alloys
  • Materials Chemistry

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