Nitrogen doping of amorphous DLC films by RF plasma dissociated nitrogen atom surface bombardment in a vacuum

Engineering & Materials Science

• Nitrogen plasma 100%
• Amorphous films 88%
• Doping (additives) 60%
• Atoms 56%
• Nitrogen 50%
• Vacuum 48%
• Amorphous carbon 41%
• Local density approximation 28%
• Plasma sources 22%
• Carbon films 21%
• Density functional theory 20%
• Plasma enhanced chemical vapor deposition 19%
• Raman spectroscopy 18%
• Stress relief 17%
• Field emission 17%
• X ray photoelectron spectroscopy 16%
• Residual stresses 11%
• Fluxes 11%

Chemical Compounds

• Nitrogen Atom 45%
• Vacuum 43%
• Amorphous Material 37%
• Plasma 33%
• Nitrogen 33%
• Liquid Film 26%
• Surface 17%
• Local-Density Approximation 15%
• Residual Stress 14%
• Plasma Enhanced Chemical Vapour Deposition 13%
• Work Function 12%
• Field Emission 10%
• Energy 10%
• Raman Spectroscopy 8%
• X-Ray Photoelectron Spectroscopy 7%
• Density Functional Theory 6%
• Reduction 4%

Physics & Astronomy

• nitrogen atoms 63%
• bombardment 51%
• nitrogen 40%
• vacuum 34%
• carbon 14%
• nitrogen plasma 13%
• high vacuum 11%
• suggestion 10%
• residual stress 10%
• field emission 9%
• Raman spectroscopy 9%
• routes 9%
• photoelectron spectroscopy 8%
• density functional theory 8%
• vapor deposition 8%
• energy 6%
• approximation 5%
• x rays 4%