Microstructure and surface profiling study on the influence of substrate type on sputtered aluminum thin films

F. M. Mwema, E. T. Akinlabi, O. P. Oladijo

Research output: Contribution to journalConference article

Abstract

In this article, the influence of the type of substrates on properties of aluminum thin films prepared through sputtering technology is presented. The deposition was undertaken at constant substrate temperature of 90 °C and RF power of 350 W for 2 h on glass and steel substrates. Microstructural properties were analyzed using field emission scanning electron microscopy (FESEM). The optical non-contact surface profiler (OSP) was used to study the topology and roughness characteristics of the films on different substrates. The results show that films grown on mild and stainless-steel substrates exhibited different morphologies and surface topology from those grown on glass substrates, indicating the influence of the substrate type on the deposition, nucleation, growth and film formation of Al thin films.

Original languageEnglish
Pages (from-to)1496-1499
Number of pages4
JournalMaterials Today: Proceedings
Volume26
Issue numberPart 2
DOIs
Publication statusPublished - 2020
Event10th International Conference of Materials Processing and Characterization, ICMPC 2020 - Mathura, India
Duration: Feb 21 2020Feb 23 2020

All Science Journal Classification (ASJC) codes

  • Materials Science(all)

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