Method for fabricating nanoscale patterns on a surface

Jens E.T. Andersen (Inventor), Qijin Chin (Inventor), Jingdong Zhang (Inventor), Esben P. Friis (Inventor), Jens Ulstrup (Inventor)

Research output: Patent

Abstract

A novel method to fabricate nanoscale pits on Au(111)
surfaces in contact With aqueous solution is claimed. The
method uses in situ electrochemical scanning tunnelling
microscopy With independent electrochemical substrate and
tip potential control and very small bias voltages. This is
signi?cantly different from other documented methods,
Which mostly apply high and short voltage pulses. The most
important advantages of the present method are that the
dimensions and positions of the pits can be controlled With
high precision in aqueous environment so that nanopatterns
of the pits can be designed, and that the operations are
simple and require no instrumental accessories. Parameters,
Which control the pit formation and siZe, have been system
atically characterized and shoW that the primary controlling
parameter is the bias voltage. A mechanism based on local
surface reconstruction induced by electronic contact
betWeen tip and substrate is in keeping With the overall
patterns for pit formation. A range of potential applications
is proposed.
Original languageEnglish
Patent numberUS6398940-B1
Filing date2/4/00
Publication statusPublished - Jun 4 2002

Fingerprint

Bias voltage
Accessories
Substrates
Contacts (fluid mechanics)
Scanning
Electric potential

Cite this

Andersen, J. E. T., Chin, Q., Zhang, J., Friis, E. P., & Ulstrup, J. (2002). Method for fabricating nanoscale patterns on a surface. (Patent No. US6398940-B1).
Andersen, Jens E.T. (Inventor) ; Chin, Qijin (Inventor) ; Zhang, Jingdong (Inventor) ; Friis, Esben P. (Inventor) ; Ulstrup, Jens (Inventor). / Method for fabricating nanoscale patterns on a surface. Patent No.: US6398940-B1. Feb 04, 2000.
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title = "Method for fabricating nanoscale patterns on a surface",
abstract = "A novel method to fabricate nanoscale pits on Au(111)surfaces in contact With aqueous solution is claimed. Themethod uses in situ electrochemical scanning tunnellingmicroscopy With independent electrochemical substrate andtip potential control and very small bias voltages. This issigni?cantly different from other documented methods,Which mostly apply high and short voltage pulses. The mostimportant advantages of the present method are that thedimensions and positions of the pits can be controlled Withhigh precision in aqueous environment so that nanopatternsof the pits can be designed, and that the operations aresimple and require no instrumental accessories. Parameters,Which control the pit formation and siZe, have been systematically characterized and shoW that the primary controllingparameter is the bias voltage. A mechanism based on localsurface reconstruction induced by electronic contactbetWeen tip and substrate is in keeping With the overallpatterns for pit formation. A range of potential applicationsis proposed.",
author = "Andersen, {Jens E.T.} and Qijin Chin and Jingdong Zhang and Friis, {Esben P.} and Jens Ulstrup",
year = "2002",
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Andersen, JET, Chin, Q, Zhang, J, Friis, EP & Ulstrup, J Feb. 04 2000, Method for fabricating nanoscale patterns on a surface, Patent No. US6398940-B1.

Method for fabricating nanoscale patterns on a surface. / Andersen, Jens E.T. (Inventor); Chin, Qijin (Inventor); Zhang, Jingdong (Inventor); Friis, Esben P. (Inventor); Ulstrup, Jens (Inventor).

Patent No.: US6398940-B1. Feb 04, 2000.

Research output: Patent

TY - PAT

T1 - Method for fabricating nanoscale patterns on a surface

AU - Andersen, Jens E.T.

AU - Chin, Qijin

AU - Zhang, Jingdong

AU - Friis, Esben P.

AU - Ulstrup, Jens

PY - 2002/6/4

Y1 - 2002/6/4

N2 - A novel method to fabricate nanoscale pits on Au(111)surfaces in contact With aqueous solution is claimed. Themethod uses in situ electrochemical scanning tunnellingmicroscopy With independent electrochemical substrate andtip potential control and very small bias voltages. This issigni?cantly different from other documented methods,Which mostly apply high and short voltage pulses. The mostimportant advantages of the present method are that thedimensions and positions of the pits can be controlled Withhigh precision in aqueous environment so that nanopatternsof the pits can be designed, and that the operations aresimple and require no instrumental accessories. Parameters,Which control the pit formation and siZe, have been systematically characterized and shoW that the primary controllingparameter is the bias voltage. A mechanism based on localsurface reconstruction induced by electronic contactbetWeen tip and substrate is in keeping With the overallpatterns for pit formation. A range of potential applicationsis proposed.

AB - A novel method to fabricate nanoscale pits on Au(111)surfaces in contact With aqueous solution is claimed. Themethod uses in situ electrochemical scanning tunnellingmicroscopy With independent electrochemical substrate andtip potential control and very small bias voltages. This issigni?cantly different from other documented methods,Which mostly apply high and short voltage pulses. The mostimportant advantages of the present method are that thedimensions and positions of the pits can be controlled Withhigh precision in aqueous environment so that nanopatternsof the pits can be designed, and that the operations aresimple and require no instrumental accessories. Parameters,Which control the pit formation and siZe, have been systematically characterized and shoW that the primary controllingparameter is the bias voltage. A mechanism based on localsurface reconstruction induced by electronic contactbetWeen tip and substrate is in keeping With the overallpatterns for pit formation. A range of potential applicationsis proposed.

M3 - Patent

M1 - US6398940-B1

Y2 - 2000/02/04

ER -

Andersen JET, Chin Q, Zhang J, Friis EP, Ulstrup J, inventors. Method for fabricating nanoscale patterns on a surface. US6398940-B1. 2002 Jun 4.