High absorptance and low emittance AR-coated Ni-Al2O3solar absorbers

T. Stephen Sathiaraj, R. Thangaraj, O. P. Agnihotri

    Research output: Contribution to journalArticle

    4 Citations (Scopus)

    Abstract

    Ni-Al2O3films of various compositions have been deposited by planar magnetron-assisted RF sputtering. The cermet films were deposited by sputtering Ni-Al2O3targets containing 32.5 wt.% and 61.6 wt.% nickel. To increase the wt.% of nickel above 61.6, additional nickel pellets distributed uniformly on the target were co-sputtered along with the target containing 61.6 wt.% nickel. The increase in wt.% depends ipon the number of nickel pellets. Al2O3and SiO2have been used as AR coatings and have been found to give similar results. Al2O3was sputter deposited from a powder target and SiO2was sputter deposited from a hot pressed target. The composition of nickel in the cermet films was found out by the EDAX technique. ESCA was used to analyse the nature of nickel and aluminium oxide. A molybdenum or nickel backing layer was used as a high reflecting coating. A 650 AA cermet film containing 0.61 volume fraction of nickel and AR coated with 780 AA Al2O3or SiO2on a nickel-backed glass substrate gives an absorptance of 0.94 (AM 1.5 solar spectrum) and an emittance of 0.07 (at 100 degrees C).

    Original languageEnglish
    Pages (from-to)250-254
    Number of pages5
    JournalJournal of Physics D: Applied Physics
    Volume23
    Issue number2
    DOIs
    Publication statusPublished - Feb 14 1990

    Fingerprint

    absorptance
    emittance
    Nickel
    absorbers
    nickel
    Cermet Cements
    pellets
    Sputtering
    sputtering
    coatings
    Coatings
    Molybdenum
    solar spectra
    Aluminum Oxide
    nickel oxides
    backups
    Chemical analysis
    Powders
    molybdenum
    Energy dispersive spectroscopy

    All Science Journal Classification (ASJC) codes

    • Condensed Matter Physics
    • Acoustics and Ultrasonics
    • Surfaces, Coatings and Films
    • Electronic, Optical and Magnetic Materials
    • Physics and Astronomy (miscellaneous)

    Cite this

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    title = "High absorptance and low emittance AR-coated Ni-Al2O3solar absorbers",
    abstract = "Ni-Al2O3films of various compositions have been deposited by planar magnetron-assisted RF sputtering. The cermet films were deposited by sputtering Ni-Al2O3targets containing 32.5 wt.{\%} and 61.6 wt.{\%} nickel. To increase the wt.{\%} of nickel above 61.6, additional nickel pellets distributed uniformly on the target were co-sputtered along with the target containing 61.6 wt.{\%} nickel. The increase in wt.{\%} depends ipon the number of nickel pellets. Al2O3and SiO2have been used as AR coatings and have been found to give similar results. Al2O3was sputter deposited from a powder target and SiO2was sputter deposited from a hot pressed target. The composition of nickel in the cermet films was found out by the EDAX technique. ESCA was used to analyse the nature of nickel and aluminium oxide. A molybdenum or nickel backing layer was used as a high reflecting coating. A 650 AA cermet film containing 0.61 volume fraction of nickel and AR coated with 780 AA Al2O3or SiO2on a nickel-backed glass substrate gives an absorptance of 0.94 (AM 1.5 solar spectrum) and an emittance of 0.07 (at 100 degrees C).",
    author = "Sathiaraj, {T. Stephen} and R. Thangaraj and Agnihotri, {O. P.}",
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    High absorptance and low emittance AR-coated Ni-Al2O3solar absorbers. / Sathiaraj, T. Stephen; Thangaraj, R.; Agnihotri, O. P.

    In: Journal of Physics D: Applied Physics, Vol. 23, No. 2, 14.02.1990, p. 250-254.

    Research output: Contribution to journalArticle

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    AU - Sathiaraj, T. Stephen

    AU - Thangaraj, R.

    AU - Agnihotri, O. P.

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    N2 - Ni-Al2O3films of various compositions have been deposited by planar magnetron-assisted RF sputtering. The cermet films were deposited by sputtering Ni-Al2O3targets containing 32.5 wt.% and 61.6 wt.% nickel. To increase the wt.% of nickel above 61.6, additional nickel pellets distributed uniformly on the target were co-sputtered along with the target containing 61.6 wt.% nickel. The increase in wt.% depends ipon the number of nickel pellets. Al2O3and SiO2have been used as AR coatings and have been found to give similar results. Al2O3was sputter deposited from a powder target and SiO2was sputter deposited from a hot pressed target. The composition of nickel in the cermet films was found out by the EDAX technique. ESCA was used to analyse the nature of nickel and aluminium oxide. A molybdenum or nickel backing layer was used as a high reflecting coating. A 650 AA cermet film containing 0.61 volume fraction of nickel and AR coated with 780 AA Al2O3or SiO2on a nickel-backed glass substrate gives an absorptance of 0.94 (AM 1.5 solar spectrum) and an emittance of 0.07 (at 100 degrees C).

    AB - Ni-Al2O3films of various compositions have been deposited by planar magnetron-assisted RF sputtering. The cermet films were deposited by sputtering Ni-Al2O3targets containing 32.5 wt.% and 61.6 wt.% nickel. To increase the wt.% of nickel above 61.6, additional nickel pellets distributed uniformly on the target were co-sputtered along with the target containing 61.6 wt.% nickel. The increase in wt.% depends ipon the number of nickel pellets. Al2O3and SiO2have been used as AR coatings and have been found to give similar results. Al2O3was sputter deposited from a powder target and SiO2was sputter deposited from a hot pressed target. The composition of nickel in the cermet films was found out by the EDAX technique. ESCA was used to analyse the nature of nickel and aluminium oxide. A molybdenum or nickel backing layer was used as a high reflecting coating. A 650 AA cermet film containing 0.61 volume fraction of nickel and AR coated with 780 AA Al2O3or SiO2on a nickel-backed glass substrate gives an absorptance of 0.94 (AM 1.5 solar spectrum) and an emittance of 0.07 (at 100 degrees C).

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