Exploring the effect of rf power in sputtering of aluminum thin films-a microstructure analysis

F. M. Mwema; E. T. Akinlabi; O. P. Oladijo

Exploring the effect of rf power in sputtering of aluminum thin films-a microstructure analysis

F. M. Mwema, E. T. Akinlabi, O. P. Oladijo

Botswana International University of Science & Technology

Research output: Chapter in Book/Report/Conference proceeding › Conference contribution

Abstract

In this article, a detailed image analysis on the field emission scanning electron microscopy of aluminum thin films sputtered on stainless steel substrates was presented. The effect of RF power on the structural and topography characteristics of the films was described. The physical observations of the surface micrographs, quantitative particle size and distribution, fractal dimensions, average surface roughness and widths of the multifractal spectra of all the films were related to the change in RF power. There existed a correlation between increasing RF power and fractal dimension and multifractal spectrum whereas there was no relationship established between power and height roughness of the films. Fractal and multifractal approaches appeared to provide better description of the effect of RF power on the sputtered Al thin films.

Original language	English
Title of host publication	4th North American IEOM Conference. IEOM 2019
Publisher	IEOM Society
Pages	745-750
Number of pages	6
ISBN (Print)	9781532359507
Publication status	Published - 2019
Event	4th North American IEOM Conference. IEOM 2019 - Toronto, Canada Duration: Oct 23 2019 → Oct 25 2019

Publication series

Name	Proceedings of the International Conference on Industrial Engineering and Operations Management
ISSN (Electronic)	2169-8767

Conference

Conference	4th North American IEOM Conference. IEOM 2019
Country	Canada
City	Toronto
Period	10/23/19 → 10/25/19

All Science Journal Classification (ASJC) codes

Strategy and Management
Management Science and Operations Research
Control and Systems Engineering
Industrial and Manufacturing Engineering

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Mwema, F. M., Akinlabi, E. T., & Oladijo, O. P. (2019). Exploring the effect of rf power in sputtering of aluminum thin films-a microstructure analysis. In 4th North American IEOM Conference. IEOM 2019 (pp. 745-750). (Proceedings of the International Conference on Industrial Engineering and Operations Management). IEOM Society.

@inproceedings{d8b48743aa854bdb8b86b67399e26cdb,

title = "Exploring the effect of rf power in sputtering of aluminum thin films-a microstructure analysis",

abstract = "In this article, a detailed image analysis on the field emission scanning electron microscopy of aluminum thin films sputtered on stainless steel substrates was presented. The effect of RF power on the structural and topography characteristics of the films was described. The physical observations of the surface micrographs, quantitative particle size and distribution, fractal dimensions, average surface roughness and widths of the multifractal spectra of all the films were related to the change in RF power. There existed a correlation between increasing RF power and fractal dimension and multifractal spectrum whereas there was no relationship established between power and height roughness of the films. Fractal and multifractal approaches appeared to provide better description of the effect of RF power on the sputtered Al thin films.",

author = "Mwema, {F. M.} and Akinlabi, {E. T.} and Oladijo, {O. P.}",

year = "2019",

language = "English",

isbn = "9781532359507",

series = "Proceedings of the International Conference on Industrial Engineering and Operations Management",

publisher = "IEOM Society",

pages = "745--750",

booktitle = "4th North American IEOM Conference. IEOM 2019",

note = "4th North American IEOM Conference. IEOM 2019 ; Conference date: 23-10-2019 Through 25-10-2019",

}

Mwema, FM, Akinlabi, ET & Oladijo, OP 2019, Exploring the effect of rf power in sputtering of aluminum thin films-a microstructure analysis. in 4th North American IEOM Conference. IEOM 2019. Proceedings of the International Conference on Industrial Engineering and Operations Management, IEOM Society, pp. 745-750, 4th North American IEOM Conference. IEOM 2019, Toronto, Canada, 10/23/19.

Exploring the effect of rf power in sputtering of aluminum thin films-a microstructure analysis. / Mwema, F. M.; Akinlabi, E. T.; Oladijo, O. P.

4th North American IEOM Conference. IEOM 2019. IEOM Society, 2019. p. 745-750 (Proceedings of the International Conference on Industrial Engineering and Operations Management).

Research output: Chapter in Book/Report/Conference proceeding › Conference contribution

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T1 - Exploring the effect of rf power in sputtering of aluminum thin films-a microstructure analysis

AU - Mwema, F. M.

AU - Akinlabi, E. T.

AU - Oladijo, O. P.

PY - 2019

Y1 - 2019

N2 - In this article, a detailed image analysis on the field emission scanning electron microscopy of aluminum thin films sputtered on stainless steel substrates was presented. The effect of RF power on the structural and topography characteristics of the films was described. The physical observations of the surface micrographs, quantitative particle size and distribution, fractal dimensions, average surface roughness and widths of the multifractal spectra of all the films were related to the change in RF power. There existed a correlation between increasing RF power and fractal dimension and multifractal spectrum whereas there was no relationship established between power and height roughness of the films. Fractal and multifractal approaches appeared to provide better description of the effect of RF power on the sputtered Al thin films.

AB - In this article, a detailed image analysis on the field emission scanning electron microscopy of aluminum thin films sputtered on stainless steel substrates was presented. The effect of RF power on the structural and topography characteristics of the films was described. The physical observations of the surface micrographs, quantitative particle size and distribution, fractal dimensions, average surface roughness and widths of the multifractal spectra of all the films were related to the change in RF power. There existed a correlation between increasing RF power and fractal dimension and multifractal spectrum whereas there was no relationship established between power and height roughness of the films. Fractal and multifractal approaches appeared to provide better description of the effect of RF power on the sputtered Al thin films.

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AN - SCOPUS:85079278691

SN - 9781532359507

T3 - Proceedings of the International Conference on Industrial Engineering and Operations Management

SP - 745

EP - 750

BT - 4th North American IEOM Conference. IEOM 2019

PB - IEOM Society

T2 - 4th North American IEOM Conference. IEOM 2019

Y2 - 23 October 2019 through 25 October 2019

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