Electrical characteristics of nitrogen incorporated hydrogenated amorphous carbon

D. P. Magill, A. A. Ogwu, J. A. McLaughlin, P. D. Maguire, R. W. McCullough, D. Voulot, D. Gillen

Research output: Contribution to journalArticlepeer-review

14 Citations (Scopus)

Abstract

The electrical and emission properties of nitorgen doped hydrogenated amophous carbon films were investigated for stress reducing and improving field emission properties. These films were prepared by plasma enhanced chemical vapor deposition under biased voltages and doping in an atomic nitrogen flux from radiofrequency plasmas. The surface morphology, film thickness and surface contact measurements were carried out using x-ray photoelectron spectroscopy, atomic force spectroscopy, surface profiling techniques and Kelvin probe method. The extraction of density of states and electrical conductivity at the fermi level were also determined.

Original languageEnglish
Pages (from-to)2456-2462
Number of pages7
JournalJournal of Vacuum Science and Technology, Part A: Vacuum, Surfaces and Films
Volume19
Issue number5
DOIs
Publication statusPublished - Sep 2001
Externally publishedYes

All Science Journal Classification (ASJC) codes

  • Condensed Matter Physics
  • Surfaces and Interfaces
  • Surfaces, Coatings and Films

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