Effect of the substrate bias on the Raman spectra and thermal stability of diamond-like carbon (DLC) and silicon-modified DLC films prepared by plasma-enhanced chemical vapour deposition (PECVD)

A. A. Ogwu, R. W. Lamberton, P. D. Maguire, J. A. McLaughlin

Research output: Contribution to journalArticlepeer-review

38 Citations (Scopus)

Abstract

An investigation of the dependence of the thermal stability of DLC (a-C:H) and silicon-modified DLC (a-C:H:Si) films on film-deposition conditions has been conducted. An interpretation based on plasma chemistry, x-ray photoelectron spectroscopy, confocal Raman spectroscopy and substrate-bias-voltage changes is proposed to explain the thermally induced structural modifications in the films between 200 and 600 °C. Our recent finding is expected to be beneficial to those designing thermal annealing schedules for reducing or eliminating residual stresses in the films.

Original languageEnglish
Pages (from-to)981-987
Number of pages7
JournalJournal of Physics D: Applied Physics
Volume32
Issue number9
DOIs
Publication statusPublished - May 7 1999
Externally publishedYes

All Science Journal Classification (ASJC) codes

  • Electronic, Optical and Magnetic Materials
  • Condensed Matter Physics
  • Acoustics and Ultrasonics
  • Surfaces, Coatings and Films

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