Engineering & Materials Science
Atomic layer deposition
100%
Nanowires
80%
Transistors
55%
Contact resistance
37%
Thin films
30%
Temperature
26%
Flexible electronics
22%
Hall effect
22%
Amorphous silicon
22%
Drain current
20%
Field effect transistors
17%
Electronic equipment
13%
Chemical Compounds
Atomic Layer Epitaxy
75%
Field Effect
64%
Nanowire
56%
Compound Mobility
49%
Contact Resistance
27%
Drain Current
16%
Hall Effect
15%
Amorphous Silicon
14%
Simulation
6%
Liquid Film
5%
Time
3%
Application
3%
Physics & Astronomy
atomic layer epitaxy
67%
nanowires
52%
transistors
52%
performance
28%
contact resistance
19%
temperature
19%
silicon transistors
12%
electronics
9%
thin films
9%
amorphous silicon
8%
Hall effect
8%
field effect transistors
7%
output
5%
simulation
3%